Kinetic study of negative dry-film photoresists
A. K. Diby, V. Yu. Voytekunas, M. J. M. Abadie
Vol. 1., No.10., Pages 673-680, 2007
DOI: 10.3144/expresspolymlett.2007.92
DOI: 10.3144/expresspolymlett.2007.92
Corresponding author: M. J. M. Abadie 
GRAPHICAL ABSTRACT
ABSTRACT
Thanks to the differential photocalorimetry technique DPC, characteristics of negative photoresists (Riston® PM 215 and Riston® MM 140, 1 mil or 25.4 µm thickness) to be developed in nonorganic aqueous medium) used in microlithography are highlighted. The photoreactivity (being evaluated by DPC) of the matrix polymer involved in these Riston® is critical for ensuring good lithographic performance. The influence of temperature and irradiation intensity on kinetic parameters such as the enthalpy of reaction ΔH, the time of induction (It), the conversion rate to the maximum peak (RPM), the coefficient rate of the reaction (k), the conversion rate α, and the polymerization rate Rp were studied. All the results highlights not only the strong differences between the two Riston® studied, but also the great reactivity of Riston® PM 215 compared to Riston® MM 140.
